Article ID Journal Published Year Pages File Type
545275 Microelectronic Engineering 2006 7 Pages PDF
Abstract

We fabricated nickel-shims including various types of structures with dimensions from hundreds of nanometers to several microns. The mastering process was made by electron-beam lithography, lift-off and reactive ion etching techniques. Then the structures were copied into a UV-curable ORMOCER-material and the Ni-shims were fabricated by electroforming using UV-copies as masters. The experiments showed that the use of UV-copying evades typical quartz master sticking and cracking problems. Furthermore, all features were replicated in the final Ni-shim as they existed in the quartz master proving the method suitable for the fabrication of the Ni-shims from the quartz masters with high precision.

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