| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 6943550 | Microelectronic Engineering | 2015 | 6 Pages |
Abstract
Etch rate of SiO2 and Si3N4 as a function of NH3/NF3 ratio.
Related Topics
Physical Sciences and Engineering
Computer Science
Hardware and Architecture
Authors
Hyun-Tae Kim, Jung-Soo Lim, Min-Su Kim, Hoon-Jung Oh, Dae-Hong Ko, Gyoo-Dong Kim, Woo-Gon Shin, Jin-Goo Park,