| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 6943750 | Microelectronic Engineering | 2013 | 4 Pages |
Abstract
- Molecular simulation of electron beam lithography is performed.
- The effect of electron exposure is introduced by chain scission of polymer molecules.
- The small segments of polymer molecules are removed in the development process.
- The typical structure of atomic scale line edge roughness is revealed.
- Electron scattering is dominant for determining the atomic scale line edge roughness.
Related Topics
Physical Sciences and Engineering
Computer Science
Hardware and Architecture
Authors
Masaaki Yasuda, Hirofumi Sakai, Rina Takai, Hiroaki Kawata, Yoshihiko Hirai,