Article ID Journal Published Year Pages File Type
6943807 Microelectronic Engineering 2013 6 Pages PDF
Abstract

- IGZO thin films etched in inductively coupled N2/BCl3/Ar plasma.
- Analyzed the surface chemical reaction of etched IGZO thin films using XPS.
- The surface morphology of IGZO thin films observed by AFM and FESEM.
Keywords
Related Topics
Physical Sciences and Engineering Computer Science Hardware and Architecture
Preview
Surface reaction effects on dry etching of IGZO thin films in N2/BCl3/Ar plasma
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