Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
6944104 | Microelectronic Engineering | 2013 | 4 Pages |
Abstract
⺠We thermochemically asses the dominant vapors present during CuO nanowire growth. ⺠A significant CuOH partial pressure exists at the Cu-Cu2O interface and is likely to be the transport precursor. ⺠This assessment is likely to be valid for other metal-oxide systems that also produce volatile hydroxides.
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Authors
A. Shalav, R.G. Elliman,