Article ID Journal Published Year Pages File Type
6944223 Microelectronic Engineering 2012 7 Pages PDF
Abstract
► Novel multilayer mask stack for high aspect ratio etching using nanosphere lithography. ► Silicon nanopillars with 75 nm diameter and an aspect ratio of 17. ► High aspect ratio polyimide nanopillars with sub-100 nm diameter. ► Silicon pillar covered surface showed superhydrophilic properties under repeated wetting conditions.
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Physical Sciences and Engineering Computer Science Hardware and Architecture
Preview
High aspect ratio silicon and polyimide nanopillars by combination of nanosphere lithography and intermediate mask pattern transfer
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