| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 6944288 | Microelectronic Engineering | 2012 | 5 Pages |
Abstract
⺠We have proposed a novel alkaline slurry without inhibitors for barrier CMP. ⺠The slurry provides lower surface roughness values and good surface quality. ⺠The slurry provides a good planarization performance. ⺠The slurry can be useful for barrier CMP.
Keywords
Related Topics
Physical Sciences and Engineering
Computer Science
Hardware and Architecture
Authors
Chenwei Wang, Yuling Liu, Jianying Tian, Baohong Gao, Xinhuan Niu,