| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 6944313 | Microelectronic Engineering | 2012 | 4 Pages |
Abstract
⺠Bow wave slurry film thickness was measured using ultraviolet enhanced fluorescence technique. ⺠Two polyetheretherketone (PEEK) retaining rings were tested under different polishing conditions. ⺠PEEK-1 generated thicker slurry film than PEEK-2. ⺠Film thickness increased with flow rate and ring pressure and decreased with sliding velocity for PEEK-1. ⺠Film thickness did not change significantly for PEEK-2.
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Authors
X. Liao, Y. Sampurno, Y. Zhuang, A. Rice, F. Sudargho, A. Philipossian, C. Wargo,