| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 6944348 | Microelectronic Engineering | 2012 | 4 Pages |
Abstract
⺠Random stamps with pyramidal patterns in nano size for T-NIL. ⺠Dry etching of Si in SF6/O2 plasma. ⺠Self-masking effect by contamination. ⺠Strong loading affects pyramid geometries. ⺠Broad angular distribution of the reflected light.
Keywords
Related Topics
Physical Sciences and Engineering
Computer Science
Hardware and Architecture
Authors
Si Wang, Andre Mayer, Khalid Dhima, Saskia Möllenbeck, Hella-Christin Scheer,