| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 6944367 | Microelectronic Engineering | 2012 | 4 Pages |
Abstract
⺠The speed of the dissolution of a photoresist film under development is monitored. ⺠The dissolution rate data reveals depth-dependent characteristics of the resist. ⺠The data is used to calibrate a resist model including surface inhibition. ⺠A comparison between simulations using that model and real profiles is presented.
Keywords
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Physical Sciences and Engineering
Computer Science
Hardware and Architecture
Authors
K. Motzek, S. Partel, A. Bramati, U. Hofmann, N. Ãnal, M. Hennemeyer, M. Hornung, A. Heindl, M. Ruhland, A. Erdmann, P. Hudek,