| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 6944384 | Microelectronic Engineering | 2012 | 4 Pages |
Abstract
⺠We synthesized a new HOI system to be used as sacrificial resist. ⺠The HOI resist was patterned with soft XRL. ⺠The patterned film was used as mask for pattern transfer in a ICP reactor. ⺠Selectivity up to 60 was obtained with a non-switched etching process.
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Authors
Gianluca Grenci, Gioia Della Giustina, Alessandro Pozzato, Erika Zanchetta, Massimo Tormen, Giovanna Brusatin,