| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 6944395 | Microelectronic Engineering | 2012 | 4 Pages |
Abstract
⺠The optical system acts as a low pass filter for mask LER frequencies above a maximum cut off. ⺠The impact of illumination symmetry is assessed by applying two different illuminations on ArF. ⺠For vertical lines, dipole illuminations attenuates the roughness transfer but aerial image degrades. ⺠EUV exposures confirm the results and are compared with a similar study on a different platform.
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Physical Sciences and Engineering
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Hardware and Architecture
Authors
Konstantinos Garidis, Alessandro Vaglio Pret, Roel Gronheid,