| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 6944397 | Microelectronic Engineering | 2012 | 5 Pages |
Abstract
⺠The formability of La-BMG during imprinting is studied under different experimental conditions. ⺠A temperature of 155 °C, a time of 10 min and a load of 400 N are proved to be optimum imprint parameters. ⺠Correlation between time and Tg or Tx is positive while correlation between time and ÎT is negative. ⺠Formability and crystallized volume fraction of La-BMG are complex function of imprint parameters. ⺠La-BMG can replicate the patterns on Si-mold and transfer its own patterns on Ce-BMG and PMMA.
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Authors
Lin Mei, Jingbei Liu, Yongjiang Huang, Jie Lin, Jun Shen, Jiubin Tan, Peng Jin,