| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 6944405 | Microelectronic Engineering | 2012 | 4 Pages |
Abstract
⺠We reported an efficient method to fabricate the nanopore arrays with large area based on single mode resonance (MSR) in the resist between the silver nanopore mask and nano-mirror. ⺠The resolution and exposure depth of the lithography patterns can be adjusted by changing the conditions of MSR. ⺠The results indicate that the silver pore-mirror device can well enhance the exposure depth and improves the resolution of photolithograph, which shows a vast application for fabricating nanostructures.
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Authors
Zhiyou Zhang, Song Ye, Shuhong Li, Zheng Yang, Jinglei Du, Fuhua Gao, Ruiying Shi, Bangcheng Yang, Xiaowei Guo,