| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 6944413 | Microelectronic Engineering | 2012 | 4 Pages |
Abstract
⺠Fabrication of inclined undercut 3D structures in fused silica by fluorocarbon gas RIBE. ⺠The structures inclination is selectable by the ion beam and substrate rotation angle. ⺠The sequential etching influences the polymer deposition silica etching mechanism. ⺠Symmetric and smooth patterns can be achieved with short etching cycles. ⺠The structures can be used for micromechanics immediately or after replication.
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Authors
K. Zimmer, J. Zajadacz, R. Fechner, K. Dhima, H.-C. Scheer,