| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 6944421 | Microelectronic Engineering | 2012 | 4 Pages |
Abstract
⺠Fabrication of nanostructures in 3D is an area of increased interest. ⺠Using plasma polymerized resists allows for conformal coating. ⺠Enables high resolution nanostructures to be defined on existing topography. ⺠Demonstrator shown: line grating at top and bottom of 20 μm trench.
Related Topics
Physical Sciences and Engineering
Computer Science
Hardware and Architecture
Authors
Rasmus H. Pedersen, Kiryl Kustanovich, Nikolaj Gadegaard,