| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 6944453 | Microelectronic Engineering | 2012 | 5 Pages |
Abstract
⺠SiO2 nano patterns are fabricated by edge lithography. ⺠Nano pattern strength is enhanced by small Si step. ⺠Nano patterns are transferred by thermal nano imprint. ⺠Polystyrene nano patterns are obtained. ⺠Si nano trench is successfully fabricated.
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Computer Science
Hardware and Architecture
Authors
Junji Sakamoto, Hayato Noma, Norifumi Fujikawa, Hiroaki Kawata, Masaaki Yasuda, Yoshihiko Hirai,