| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 6944460 | Microelectronic Engineering | 2012 | 4 Pages |
Abstract
⺠The patterning steps of grating pattern and stop layer are separated. ⺠The grating patterning can be more efficient by using nanoimprint lithography. ⺠The imprinted SU-8 grating can function as the EUV diffraction grating directly.
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Physical Sciences and Engineering
Computer Science
Hardware and Architecture
Authors
Chun-Hung Lin, Yi-Ming Lin, Chia-Ching Liang, Yin-Yu Lee, Hok-Sum Fung, Bor-Yuan Shew, Szu-Hung Chen,