| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 6944462 | Microelectronic Engineering | 2012 | 4 Pages |
Abstract
⺠We use IBL to fabricate zone plates in 500 nm gold on silicon nitride membranes. ⺠The zone plate's diameter is 100 μm with 100 nm outermost zone width. ⺠The desired accuracy requires a 15 h process with automatic drift compensation. ⺠We analyze the quality of the zones by SEM imaging and cross sectioning. ⺠Lens functionality is proven by first X-ray measurements.
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Authors
A. Nadzeyka, L. Peto, S. Bauerdick, M. Mayer, K. Keskinbora, C. Grévent, M. Weigand, M. Hirscher, G. Schütz,