Article ID Journal Published Year Pages File Type
6944481 Microelectronic Engineering 2012 4 Pages PDF
Abstract
► The resist thickness, pressure and contact angle as the factors. ► To understand factors, NIL experiments and NIL simulations have been conducted. ► NIL experiment by ANT-2T and NIL simulations by FLUENT. ► Capillary force is dominant at the low pressure in NIL process. ► Contact angles are reduced as pressure increases.
Related Topics
Physical Sciences and Engineering Computer Science Hardware and Architecture
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