| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 6944499 | Microelectronic Engineering | 2012 | 4 Pages |
Abstract
⺠Inorganic resists (non CAR) were evaluated and exposed using a 50kV VSB writer. ⺠The resists are based on hafnium oxides and spin-cast from aqueous solutions. ⺠XE15IB shows high resolution with dose and contrast comparable to HSQ. ⺠XE15CB shows high resolution and improved sensitivity, but a reduction in contrast. ⺠The exposure of a large SRAM metal 1 layer pattern (CD of 22 nm) was demonstrated.
Related Topics
Physical Sciences and Engineering
Computer Science
Hardware and Architecture
Authors
Xaver Thrun, Kang-Hoon Choi, Martin Freitag, Andrew Grenville, Manuela Gutsch, Christoph Hohle, Jason K. Stowers, Johann W. Bartha,