| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 6944509 | Microelectronic Engineering | 2012 | 4 Pages |
Abstract
⺠UV-curing organic polymers as resists for UV-SCIL were investigated. ⺠UV-SCIL processes for two fully organic polymers were developed. ⺠A reduction of UV-SCIL process time was achieved using an epoxy based resist. ⺠Structures were transferred using imprinted polymer layers as etching masks. ⺠A temperature assisted UV-SCIL process with epoxy based resists is introduced.
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Authors
R. Fader, H. Schmitt, M. Rommel, A.J. Bauer, L. Frey, R. Ji, M. Hornung, M. Brehm, M. Vogler,