| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 6944533 | Microelectronic Engineering | 2012 | 4 Pages |
Abstract
⺠We studied electron beam exposure properties of high molecular weight polystyrene. ⺠Its sensitivity increases linearly with molecular weight. ⺠For 900 kg/mol, the sensitivity is 1.1 μC/cm2 when exposed at 2 keV. ⺠The sensitivity is one order higher than PMMA and ZEP-520A. ⺠Line array patterns of 100 nm half pitch can be well defined in polystyrene.
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Authors
Celal Con, Ripon Dey, Mark Ferguson, Jian Zhang, Raafat Mansour, Mustafa Yavuz, Bo Cui,