| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 6944576 | Microelectronic Engineering | 2012 | 5 Pages |
Abstract
⺠With the Pt-coated cantilever, we patterned on the Optool DSX (0.1%) surface by electron assisted AFM lithography. ⺠The delineated distance of the line pattern was 2000 μm (= 2 mm). ⺠The line width remained constant at 60 nm from start to finish. ⺠The lifespan of the cantilever was improved by more than 8 times. ⺠Electron assisted AFM lithography provides a simple, low-cost nano-imprint lithography mold fabrication.
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Authors
Takao Inoue, Jun Taniguchi, Toshihiko Ochi,