| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 6944609 | Microelectronic Engineering | 2012 | 4 Pages |
Abstract
⺠We develop facile fabrication for single crystalline Si tubular nanostructures. ⺠Thin metal film is thermally dewetted to form nanodots for etch mask in Si RIE. ⺠Redeposition of metal from nanodot during RIE produces metal rim around nanodot. ⺠Etch rate difference between Si and nanodot/rim results in tubular nanostructure. ⺠Lithography-free and large-area fabrication of tubular nanostructure is proposed.
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Authors
Hak-Kyun Jung, Jungwook Choi, Hyungjoo Na, Dae-Sung Kwon, Min-Ook Kim, Jeong-Jin Kang, Jongbaeg Kim,