Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
6944610 | Microelectronic Engineering | 2012 | 5 Pages |
Abstract
⺠Methods to fabricate planar, geometrically asymmetric Ni-NiOx-Ni tunnel diodes are developed. ⺠Planar structure decreased the parasitic capacitance enabling high cut-off frequency. ⺠Ni electrodes provided the surface oxidation control and low band edge offset with its native oxide. ⺠Asymmetric geometry of the electrodes resulted in electrical asymmetry across zero bias. ⺠Three Ni oxidation methods are studied to build a thin, but durable oxide for the tunnel barrier.
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Authors
Filiz Yesilkoy, Sunil Mittal, Neil Goldsman, Mario Dagenais, Martin Peckerar,