Article ID Journal Published Year Pages File Type
6944610 Microelectronic Engineering 2012 5 Pages PDF
Abstract
► Methods to fabricate planar, geometrically asymmetric Ni-NiOx-Ni tunnel diodes are developed. ► Planar structure decreased the parasitic capacitance enabling high cut-off frequency. ► Ni electrodes provided the surface oxidation control and low band edge offset with its native oxide. ► Asymmetric geometry of the electrodes resulted in electrical asymmetry across zero bias. ► Three Ni oxidation methods are studied to build a thin, but durable oxide for the tunnel barrier.
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Physical Sciences and Engineering Computer Science Hardware and Architecture
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