Article ID Journal Published Year Pages File Type
6944691 Microelectronic Engineering 2012 5 Pages PDF
Abstract
► Growth behaviors of Ir films using hybrid ALD were investigated. ► The 3.2 nm thick Ir film was grown by hybrid ALD under 50 deposition cycles. ► The grown Ir layer exhibited typical self-limited nature of ALD. ► High conformality of 0.88 is achieved on 32 nm wide nano trench.
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Preview
Effect of hydrogen plasma on growth of Ir thin film by plasma-enhanced hybrid atomic layer deposition
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