| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 6944786 | Microelectronic Engineering | 2012 | 5 Pages |
Abstract
⺠Contact Edge Roughness is evaluated through the analysis of Scanning Electron Microscopy images. ⺠Emphasis is given on frequency (power spectrum) and spatial (height-heigth correlation function) aspects of CER. ⺠We find that local process variations affect more CD and CER uncertainty than image magnification and noise smoothing filter.
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Authors
M.K. Vijaya-Kumar, Vassilios Constantoudis, Evangelos Gogolides, Alessandro Vaglio Pret, Roel Gronheid,