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TaN/Ta bilayer barrier characteristics and integration for 90 and 65 nm nodes

Article ID Journal Published Year Pages File Type
9670364 Microelectronic Engineering 2005 5 Pages PDF
Abstract
These results presented in this paper clarify the role of individual process steps during the barrier deposition.
Keywords
BilayerBarrierCharacteristics
Related Topics
Physical Sciences and Engineering Computer Science Hardware and Architecture
Preview
TaN/Ta bilayer barrier characteristics and integration for 90 and 65 nm nodes
Authors
J.-P. Jacquemin, E. Labonne, C. Yalicheff, E. Royet, P. Vannier, R. Delsol, P. Normandon,
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Journal
Microelectronic Engineering
Journal: Microelectronic Engineering
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