Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
9670586 | Microelectronic Engineering | 2005 | 5 Pages |
Abstract
We apply self-assembly to form multilayers on gold structures formed by lithographic techniques to create patterns with spacings in the 10-100Â nm regime. Controlled placement and thickness of these multilayers form “molecular ruler” resists to tailor spacings accurately between lithographically defined structures. We report on recent results both in designing and patterning complex nanostructures by combining photolithography and molecular rulers. After exposure, development, metal deposition, and lift-off of both the photoresist and molecular resist, the final product has secondary structures and gaps selectively oriented to create hierarchical nanostructures. The electrical integrity of the nanogaps formed using this process is evaluated for a variety of multilayer thicknesses and electrodes widths.
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Computer Science
Hardware and Architecture
Authors
M.E. Anderson, Charan Srinivasan, Raviprakesh Jayaraman, P.S. Weiss, M.W. Horn,