Article ID Journal Published Year Pages File Type
9670593 Microelectronic Engineering 2005 7 Pages PDF
Abstract
We have screened several organic precursors for focused electron beam induced deposition of carbon. The growth rates are found to be higher with the light carboxylic acid series than with styrene. The deposits obtained are analyzed by several micro-characterization methods. They have close compositions and structures, quite independently on the nature of the precursor. Besides C, the deposits contain only O and H. The compositions of the deposits are shown to be close to C9H2O1. The C fraction is amorphous carbon, more than 90% sp2. Two electron-induced processes occur: electron-induced precursor fixation and desorption of volatile elements.
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