Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
9670594 | Microelectronic Engineering | 2005 | 7 Pages |
Abstract
We present evidence that during focused electron beam induced deposition of 3D micro- and nanostructures, different growth rates are obtained when scanning the beam towards different directions, as well as on different sides of a growing structure. The effects of electron scattering are taken into account and shown to account only partially for this observation. We propose an interpretation in terms of gas dynamics around the deposits. Our observation and description of this effect could serve the future design of complex shapes.
Related Topics
Physical Sciences and Engineering
Computer Science
Hardware and Architecture
Authors
Tristan Bret, Ivo Utke, Patrik Hoffmann,