| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 9670598 | Microelectronic Engineering | 2005 | 7 Pages |
Abstract
Deposition characteristics onto poly (methyl methacrylate) and poly (tetrafluoro ethylene) substrates are examined for SiO2 and latex particles. Pattern resolution and definition are found to depend on the balance of Coulomb and dipolar forces. Not only the amount of charge deposited and charge pattern geometry influence this force balance, but also the material of the electret layer.
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Authors
N. Naujoks, A. Stemmer,