A single-step process for making nanofluidic channels using electron beam lithography

In this work, we demonstrate a simple, single-step process using electron-beam lithography to write parallel ribs of cross-linked UV-3 resist. The resist is spun on to a SiO2 layer on a silicon substrate. If the resist thickness, electron dose, rib width and gap width all lie within a limited range, then the ribs collapse or fold towards each other making a sealed contact at the apex. This action depends on the exploitation of the forces of surface tension and capillarity during the final drying process.