| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 9670608 | Microelectronic Engineering | 2005 | 5 Pages |
Abstract
Various types of line ends have been evaluated for either straight CPL mask or hybrid type builds. The authors will focus on image line end shortening and the impact of through dose and focus performance for very high NA ArF imaging. Simulations on test structures have been calculated along with in photoresist simulations to predict the impact on process window capability. Test structures have been designed and fabricated into a functional test for evaluation. Process evaluations have been completed and exposure-defocus window calculated.
Related Topics
Physical Sciences and Engineering
Computer Science
Hardware and Architecture
Authors
Will Conley, Jan Pieter Kuijten, Arjan Verhappen, Stefan van de Goor, Lloyd Litt, Wei Wu, Kevin Lucas, Bernie Roman, Bryan Kasprowicz, Chris Progler, Robert Socha, Doug van den Broeke, Kurt Wampler, Tom Laidig, Stephen Hsu, Erika Schaefer, Pat Cook,