Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
9670618 | Microelectronic Engineering | 2005 | 5 Pages |
Abstract
The first results of experiments on direct photo-etching of organic polymers using a 10Â Hz X-ray source based on a laser-irradiated gas puff target are presented. X-ray radiation in the wavelength range from 2 to 15Â nm was produced as a result of irradiation of a double-stream gas puff target with Nd:YAG laser pulses of energy 0.8Â J and time duration 3Â ns. The resulting X-ray pulses with energy of about 100-200Â mJ were used to irradiate samples of organic polymers to create microstructures by direct photo-etching. The obtained results show that direct photo-etching using the laser-plasma X-ray source could be useful for micromachining of organic polymers.
Keywords
Related Topics
Physical Sciences and Engineering
Computer Science
Hardware and Architecture
Authors
A. Bartnik, H. Fiedorowicz, R. Jarocki, L. Juha, J. Kostecki, R. Rakowski, M. Szczurek,