| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 9670625 | Microelectronic Engineering | 2005 | 7 Pages |
Abstract
Allyl prepolymers reported here are modified with the aim of obtaining high quality imprints at decreased imprint temperature and reduced cycle time of the imprint process. Free-radical initiators are applied to increase the polymerization rate and to let the polymerization start at lower temperatures. Adding plasticizers results in a decrease in Tg. Most favourable systems are selected out of a variety of various mixtures for imprint tests.
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Authors
F. Reuther, M. Fink, M. Kubenz, C. Schuster, M. Vogler, G. Gruetzner,