Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
9670638 | Microelectronic Engineering | 2005 | 5 Pages |
Abstract
A method for fabricating sub-micrometer size adhesion sites for future experiments in cell biology is presented. Glass substrates were coated with a thin layer of InSnO and SiO2. The SiO2 was structured by means of electron beam lithography and reactive ion etching, exposing sub-micrometer patches of the underlying InSnO. Dodecylphosphate, to which proteins can bind, was selectively adsorbed on these InSnO structures, whereas poly-l-lysine-g-poly(ethylene glycol) was used to passivate the surrounding SiO2 against protein adsorption. The effectiveness of the process was investigated by fluorescent microscopy and scanning near-field optical microscopy on substrates which have been exposed to fluorescently labeled streptavidin.
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Authors
P.A. Künzi, J. Lussi, L. Aeschimann, G. Danuser, M. Textor, N.F. de Rooij, U. Staufer,