| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 544480 | Microelectronic Engineering | 2011 | 5 Pages |
Abstract
A process is developed for the fabrication of vertically arranged poly-silicon nanowires via a rigorously top-down batch process. The technique allows the production of wire arrays with larger linear density (projected on the surface) than those achievable with any of the other proposed top-down processes.
Related Topics
Physical Sciences and Engineering
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Hardware and Architecture
Authors
M. Ferri, F. Suriano, A. Roncaglia, S. Solmi, G.F. Cerofolini, E. Romano, D. Narducci,