کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
10303608 545607 2015 25 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Associations between five-factor model of the Positive and Negative Syndrome Scale and plasma levels of monoamine metabolite in patients with schizophrenia
ترجمه فارسی عنوان
ارتباط بین مدل پنج عاملی مقیاس سندرم مثبت و منفی و میزان پلاکت متابولیت مونوآمین در بیماران مبتلا به اسکیزوفرنیا
موضوعات مرتبط
علوم زیستی و بیوفناوری علم عصب شناسی روانپزشکی بیولوژیکی
چکیده انگلیسی
The five-factor model of the Positive and Negative Syndrome Scale (PANSS) for schizophrenia symptoms is the most common multiple-factor model used in analyses; its use may improve evaluation of symptoms in schizophrenia patients. Plasma monoamine metabolite levels are possible indicators of clinical symptoms or response to antipsychotics in schizophrenia. We investigated the association between five-factor model components and plasma monoamine metabolites levels to explore the model's biological basis. Plasma levels of homovanillic acid (HVA), 3-methoxy-4-hydroxyphenylglycol (MHPG), and 5-hydroxyindoleacetic acid (5-HIAA) were measured using high-performance liquid chromatography in 65 Japanese patients with schizophrenia. Significant negative correlation between plasma 5-HIAA levels and the depression/anxiety component was found. Furthermore, significant positive correlation was found between plasma MHPG levels and the excitement component. Plasma HVA levels were not correlated with any five-factor model component. These results suggest that the five-factor model of the PANSS may have a biological basis, and may be useful for elucidating the psychopathology of schizophrenia. Assessment using the five-factor model may enable understanding of monoaminergic dysfunction, possibly allowing more appropriate medication selection. Further studies of a larger number of first-episode schizophrenia patients are needed to confirm and extend these results.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Psychiatry Research - Volume 230, Issue 2, 15 December 2015, Pages 419-423
نویسندگان
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