Growth and erosion of amorphous carbon (a-C:H) films by low-temperature laboratory plasmas containing H and N mixtures
Keywords: E0400; F0400; P0500; R0900; S1300; 52.77.Bn; 52.77.Dq; 81.05.Uw; 81.15.Jj; Amorphous films (a-C:D); Chemical erosion (chemical sputtering) co-deposition; Erosion; Deposition (redeposition, erosion, deposition); Ion-surface interaction;