کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
10155943 | 1666369 | 2019 | 10 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Influence of bias voltage on the microstructure, mechanical and corrosion properties of AlSiN films deposited by HiPIMS technique
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فلزات و آلیاژها
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
AlSiN films were deposited with various bias voltages ranging from 0â¯V to - 150â¯V by high power impulse magnetron sputtering (HiPIMS) technique. The effects of bias voltage on the microstructure, mechanical and corrosion behavior were investigated. The AlSiN films exhibited an over-stoichiometric N content and both cubic and hexagonal AlN were observed in films. All deposited films showed a typical surface feature of granular structure and the cross-sectional images exhibited that all films possessed columnar structure, which was changed from coarse columnar to denser columnar structure with increasing the bias voltage. The AlSiN film deposited at - 150â¯V possessed the densest structure and exhibited the best mechanical properties, including hardness, toughness and nano-wear resistance. The corrosion test showed that all coated samples had better corrosion resistance compared to SUS304 in 3.5â¯wt.% NaCl solution and the AlSiN film deposited at bias voltage of - 150â¯V possessed the best corrosion resistance due to denser microstructure, which could act as a barrier layer for blocking the diffusion of corrosive substances.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Alloys and Compounds - Volume 772, 25 January 2019, Pages 112-121
Journal: Journal of Alloys and Compounds - Volume 772, 25 January 2019, Pages 112-121
نویسندگان
Ji Cheng Ding, Qi Min Wang, Zhe Ren Liu, Seonhee Jeong, Teng Fei Zhang, Kwang Ho Kim,