Using colloid lithography to fabricate silicon nanopillar arrays on silicon substrates

► Generating a density adjustable AuNP self-assembly layer onto the Si surface. ► Self-assembled AuNP layer is patterned as 200 nm resolution line by lithography. ► Si nanopillars featured high density and aspect ratio are generated by AuNP mask. ► We fabricate Si nanopillar array as 200 nm resolution line patterns on the surface.