کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
10645085 | 999835 | 2011 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Bombardment of a Si pitch grating by C+ ions at an inclined incident angle parallel to the structure
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی انرژی
انرژی هسته ای و مهندسی
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چکیده انگلیسی
In this work, the bombardment of a nano-scale Si pitch grating with 6 kV C+ ions at an angle of incidence of 42° parallel to the structure is investigated both experimentally and by simulations with the SDTrimSP-2D code. The study focuses on the relation between the nano- and macro-scale parameters of ion-surface interactions. The macro-scale parameters are the sputter yields of Si and C atoms and the areal density of the C atoms deposited on the surface; the nano-scale parameter is the 2D profile of the structure. The nano-scale surface profile was obtained experimentally by scanning electron microscopy of specimen cross-sections. The comparison between experiment and simulation reveals good agreement on both macro- and nano-scales.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Nuclear Materials - Volume 415, Issue 1, Supplement, 1 August 2011, Pages S200-S203
Journal: Journal of Nuclear Materials - Volume 415, Issue 1, Supplement, 1 August 2011, Pages S200-S203
نویسندگان
R. Schneider, A. Mutzke, I. Bizyukov, J.W. Davis,