Preparation of pillared carbon thin films from the reduction of silylated graphite oxide by UV light irradiation and their size selective electrical response to various molecules

Silylated graphite oxide thin films were reduced by UV light irradiation using a super high pressure Hg lamp at 95 °C. The reduction of silylated graphite oxide was completed within 24 h and a new pillared carbon with an interlayer spacing of 0.81 nm was obtained. Pillared carbons with larger interlayer spacings of about 1.13 nm were also obtained from graphite oxide silylated with octyltrichlorosilane and then with 3-aminopropyltriethoxysilane for 1.5–6 h, when they were reduced by UV light irradiation and heating at 200 °C under vacuum. Selective electrical response during exposure to gaseous vinylene carbonate, acetonitrile, ozone and hydrogen molecules has been achieved by changing the pillar density in the resulting pillared carbon films.