کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1484539 991634 2008 7 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Isothermal and non-isothermal crystallization kinetics in amorphous Ni45.6Ti49.3Al5.1 thin films
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد سرامیک و کامپوزیت
پیش نمایش صفحه اول مقاله
Isothermal and non-isothermal crystallization kinetics in amorphous Ni45.6Ti49.3Al5.1 thin films
چکیده انگلیسی
The crystallization kinetics in Ni45.6Ti49.3Al5.1 film were studied by differential scanning calorimetry through isothermal and non-isothermal approaches. The activation energy for crystallization was determined to be 374 and 280 kJ/mol by the Kissinger and the Augis & Bennett method, respectively, in non-isothermal methods. In the isothermal annealing study, the Avrami exponents were in the range of 2.78-3.80 between 793 and 823 K, suggesting that the isothermal annealing was governed by three dimensional diffusion-controlled growth for Ni45.6Ti49.3Al5.1 thin films, in which the activation energy of nucleation is higher than that of growth. In addition, the transformation rate curves of Ni45.6Ti49.3Al5.1 film were also constructed by isothermal methods. The crystallization kinetics of amorphous Ni45.6Ti49.3Al5.1 film can thus be appreciated and the transformation rate also can be employed to control the degree of crystallization.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Non-Crystalline Solids - Volume 354, Issue 27, 1 June 2008, Pages 3159-3165
نویسندگان
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