کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1608146 | 1516243 | 2015 | 30 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Wear behavior and corrosion properties of Fe-based thin film metallic glasses
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فلزات و آلیاژها
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چکیده انگلیسی
Fe48Mo14Cr15Y2C15B6 (at%) thin film metallic glasses (TFMGs) with various thickness (125-745Â nm) were deposited on glass and 304 stainless steel (SS) by using single-alloy target magnetron sputtering. X-ray diffraction and transmission electron microscopy verified the fully amorphous structure of the as-deposited films. Results of dry friction and wear tests against Si3N4 demonstrated that Fe-based TFMGs had lower friction coefficient and nearly three times higher wear resistance with respective to 304SS. The corrosion properties of the Fe-based TFMGs were evaluated in an artificial sweat solution by various electrochemical analytical techniques, including potentiodynamic, potentiostatic polarization and Mott-Schottky analysis. It was shown that the Fe-based TFMGs exhibited highly stable passivity and pitting resistance, which was significantly higher than that of uncoated 304SS. The good corrosion resistance of Fe-based TFMGs results from the lower defect density and higher thickness of the as-formed passive film as compared to 304SS. The pitting of the Fe-based TFMGs follows three distinct stages, i.e., pitting initiation, metastable pitting and stable pitting, as well as substrate dissolution-induced film rupture due to the adsorption and penetration of chloride ions in the artificial sweat solution. These findings are expected to broaden the application of Fe-based TFMGs as a highly protective film for electronic device applications.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Alloys and Compounds - Volume 650, 25 November 2015, Pages 127-135
Journal: Journal of Alloys and Compounds - Volume 650, 25 November 2015, Pages 127-135
نویسندگان
Zhi Li, Cheng Zhang, Lin Liu,