کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1641367 1517212 2016 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Growth mechanism of In-doped β-Ga2O3 nanowires deposited by radio frequency powder sputtering
کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Growth mechanism of In-doped β-Ga2O3 nanowires deposited by radio frequency powder sputtering
چکیده انگلیسی
We investigate the growth mechanism of In-doped β-Ga2O3 nanowires (NWs) deposited using radio frequency powder sputtering. Although the growth sequence of the doped NWs is similar to that of the undoped β-Ga2O3 NWs, the formation of self-assembled In clusters is more favorable compared to Ga clusters. Clusters of In act as seeds for initiating the growth of In-doped β-Ga2O3 NWs through a self-catalytic vapor-liquid-solid mechanism, while Ga seeds initiate the growth of undoped β-Ga2O3 NWs by the same mechanism. We also observed zigzag NWs formed by alternating NW growth directions.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Letters - Volume 176, 1 August 2016, Pages 213-218
نویسندگان
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