کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1668670 | 1008873 | 2011 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Metalorganic chemical vapor deposition of β-FeSi2 on β-FeSi2 seed crystals formed on Si substrates
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Metalorganic chemical vapor deposition of β-FeSi2 on β-FeSi2 seed crystals formed on Si substrates Metalorganic chemical vapor deposition of β-FeSi2 on β-FeSi2 seed crystals formed on Si substrates](/preview/png/1668670.png)
چکیده انگلیسی
We have fabricated a β-FeSi2 film by metalorganic chemical vapor deposition on a Si(001) substrate with β-FeSi2 seed crystals grown by molecular beam epitaxy, and investigated the crystallinity, surface morphology and temperature dependence of photoresponse properties of the β-FeSi2 film. The surface of the grown β-FeSi2 film was atomically flat, and step-and-terrace structure was clearly observed. Multi-domain structure of β-FeSi2 whose average size was approximately 200 nm however was revealed. The photoresponse was obtained in an infrared light region (~ 0.95 eV) at temperatures below 200 K. The external quantum efficiency reached a maximum, being as large as 25% at 100 K when a bias voltage was 2.0 V.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 519, Issue 24, 3 October 2011, Pages 8473–8476
Journal: Thin Solid Films - Volume 519, Issue 24, 3 October 2011, Pages 8473–8476
نویسندگان
Mitsushi Suzuno, Keiichi Akutsu, Hideki Kawakami, Kensuke Akiyama, Takashi Suemasu,