کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1681778 1010448 2010 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
The annealing behavior of Cu nanoparticles in Ar-ion implanted spinel
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد سطوح، پوشش‌ها و فیلم‌ها
پیش نمایش صفحه اول مقاله
The annealing behavior of Cu nanoparticles in Ar-ion implanted spinel
چکیده انگلیسی
Magnesium aluminate spinel crystals (MgAl2O4 (1 1 0)) deposited with 30 nm Cu film on surface were implanted with 110 keV Ar-ions to a fluence of 1.0 × 1017 ions/cm2 at 350 °C, and then annealed in vacuum condition at the temperature of 500, 600, 700, 800 and 900 °C for 1 h, respectively. Ultraviolet-visible spectrometry (UV-VIS), scanning electron microscopy (SEM), Rutherford backscattering (RBS) and transmission electron microscopy (TEM) were adopted to analyze the specimens. After implantation, the appearance of surface plasmon resonance (SPR) absorbance peak in the UV-VIS spectrum indicated the formation of Cu nanoparticles, and the TEM results for 500 °C also confirmed the formation of Cu nanoparticles at near-surface region. In annealing process, The SPR absorbance intensity increased at 500 and 700 °C, decreased with a blue shift of the peak position at 600 and 800 °C, and the peak disappeared at 900 °C. The SPR absorbance intensity evolution with temperature was discussed combined with other measurement results (RBS, SEM and TEM).
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 268, Issue 16, 15 August 2010, Pages 2492-2495
نویسندگان
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